鏡面鋁板的鏡面效果來源于兩個方面,一是基材本身要達(dá)到鏡面,二是氧化膜要高度清純透明.的氧化鋁板鏡面效果有目共睹，現(xiàn)在技術(shù)員與大家分析鏡面效果的形成。
Mirror surface of the mirror surface results from two aspects, one is the substrate itself to reach the mirror, the two is the oxide film to be highly pure and transparent. The effect of the mirror surface of the aluminum oxide plate is obvious. Now the technician and everyone analysis the formation of the mirror effect.
鋁合金表面做草酸氧化膜和鉻酸氧化膜帶有顏色,不是清澈透明的,自然不在考慮之列.對硫酸氧化膜而言,影響透明度的因素主要有:氧化膜純度/氧化膜厚度/氧化膜孔隙率/封孔質(zhì)量.氧化膜中如果裹挾有過多的硅/錳/鐵/銅/鉻等雜質(zhì)離子(或原子),氧化膜的純度就低,透明度就會下降。
The oxalic acid oxide film and chromic acid oxide film on the surface of the aluminum alloy are color, not clear and transparent, and naturally are not considered. For the sulfuric acid oxide film, the factors that affect the transparency are the purity of the oxide film / the thickness of the oxide film / the porosity of the oxide film / the quality of the sealing. If there are too many impurities such as silicon / manganese / iron / copper / chromium in the oxide film, the oxide film is bound to be too much. Ion (or atom), the purity of the oxide film is low, and the transparency will decrease.
鋁合金表面做草酸氧化膜和鉻酸氧化膜帶有顏色,不是清澈透明的,自然不在考慮之列.對硫酸氧化膜而言,影響透明度的因素主要有:氧化膜純度/氧化膜厚度/氧化膜孔隙率/封孔質(zhì)量.氧化膜中如果裹挾有過多的硅/錳/鐵/銅/鉻等雜質(zhì)離子(或原子),氧化膜的純度就低,透明度就會下降.氧化膜雖然是透光的,但也會有一些光散射損失.氧化膜厚度增加時透明度也會下降.氧化膜的針孔是光散射的主要根源,孔隙率越高光散射就越多.

The oxalic acid oxide film and chromic acid oxide film on the surface of the aluminum alloy are color, not clear and transparent, and naturally are not considered. For the sulfuric acid oxide film, the factors that affect the transparency are the purity of the oxide film / the thickness of the oxide film / the porosity of the oxide film / the quality of the sealing. If there are too many impurities such as silicon / manganese / iron / copper / chromium in the oxide film, the oxide film is bound to be too much. The purity of the oxide film is low and the transparency will decrease. Although the oxide film is transparent, there will be some light scattering loss. The transparency of the oxide film will decrease when the thickness of the oxide film increases. The higher the porosity is, the more the light scattering is.
特別是針孔呈顯著的喇叭形時,光散射會急劇增加,透明度就會迅速下降.封孔物質(zhì)是勃姆石,常溫封孔時還有氫氧化鎳和氟鋁酸鹽,它們都是透明的,因此正常的封孔基本上不會降低氧化膜的透明度.但是如果發(fā)生過封孔,所形成的粉霜就全部成為光散射質(zhì)點(diǎn),就會使氧化膜的透明度大幅降低.所以,改善氧化膜的透明度應(yīng)從提高氧化膜純度/控制氧化膜厚度/降低氧化膜孔隙率/保證封孔適度這四個方面入手。
In particular, the light scattering will increase sharply and the transparency will decline rapidly when the pinhole is displayed. The sealing material is the boehmite, and at normal temperature, there are nickel hydroxide and fluoro aluminate, all of them are transparent, so the normal sealing will not reduce the transparency of the oxide film basically. As for all light scattering particles, the transparency of the oxide film will be greatly reduced. Therefore, the improvement of the transparency of the oxide film should start with the four aspects of improving the purity of the oxide film / controlling the thickness of the oxide film / reducing the porosity of the oxide film / ensuring the moderation of the sealing hole.
氧化膜中的雜質(zhì)主要來源于鋁件本身,次要來源是氧化槽液.因此,適當(dāng)降低鋁件中合金元素的含量,盡量降低鋁件的雜質(zhì)含量,甚至選用高純鋁都能提高氧化膜純度.降低槽液中的雜離子,保持槽液新鮮也能提高氧化膜純度.氧化膜厚度以控制在10-12um為宜,如果產(chǎn)品標(biāo)準(zhǔn)不要求氧化膜厚度>=10um,則將氧化膜厚度控制在6-8um.氧化膜的孔隙率主要取決于溶膜速度,溶膜越快則孔隙率越大.溶膜速度與硫酸濃度/槽液溫度/電流密度成正變關(guān)系,因此,適當(dāng)降低硫酸濃度/槽液穩(wěn)度/電流密度過都會降低氧化膜的孔率。
The impurities in the oxide film are mainly from the aluminum itself and the secondary source is the oxidation slot. Therefore, it is necessary to reduce the content of the alloy elements in the aluminum parts, reduce the content of the impurities in the aluminum parts as much as possible, and even select the high purity aluminum to improve the purity of the oxide film. In order to control the 10-12um, if the product standard does not require the oxide film thickness of >=10um, the porosity of the oxide film is mainly controlled by the dissolution rate of the 6-8um. oxide film. The faster the dissolution of the film, the larger the porosity is, the relationship between the dissolution rate and the concentration of sulphuric acid / bath liquid temperature / current density is positive. Therefore, the sulphuric acid concentration / slots are appropriately reduced. Stability or current density will reduce the porosity of the oxide film.
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